Dual Side/Single Side Photo Lithography Exposure Machine MD-Bg-403D & 403s

Dual side/single side photo lithography exposure machine MD-BG-403D & 403S

 

MD-BG-403D & 403S Mask Aligner is used in exposure process of GPP diode, power device, and other semiconductor device, with convenient operation, steady performance and high productivity.

Main Features:
Mask chuck: two pieces of mask chuck, exposure with exchange, improving work efficiency.
Size of mask: Max5″×5″
Size of wafer: Maxφ4″
Exposure system:Using import mercury lamp,ellipsoidal reflector ,fly's eyes- lens. High light intensity, uniformity and optics resolution can be obtained.
Exposuring  Resolution: 5um 
Exposure light  intensity: ≥10mW/cm2(365nm)
Exposure time:0-999.9s continuous setting
Max exposure area: φ110mm
Non-uniformity: ±3%
Align microscope
Align microscope: two pieces of microscope, operated by two person at the same time, improving productivity.
Total magnification: 20×~40×
Electric control system
Operation is convenient by PLC and LCD display adopted in electric control system, and high reliability and stability could be obtained. Stability and reliability of the equipment are improved by use of key parts from import and professional manufacturer and pneumatic elements from SMC, and personal service is provided for different user.

 

Main Specifications:
Size of mask: Max5″×5″
Size of wafer: Maxφ4″
Exposuring  resolution:5um
Exposure system and wavelength
250W High pressure mercury lamp, UV365
Exposure time:0-999.9s continuous setting
Max Exposure area: φ110mm
Non-uniformity of Exposure: ±3%
Split view field microscope
Total magnification: 20×~40×

Comprason table:

 

-----------------------------------

Guangzhou minder-hightech co., ltd       

No.1 Xingya 3 Road, panyu district, guangzhou, China

Shunyu Hu   0086-15813334038  
Cell phone